Patent
1985-12-09
1987-07-21
Munson, Gene M.
357 58, 357 16, 357 52, 357 56, H01L 2714, H01L 29205, H01L 2912
Patent
active
046821961
ABSTRACT:
A semiconductor device, which is formed by a sequential lamination of a first semiconductor layer having a carrier concentration more than 10.sup.17 cm.sup.-3, a second semiconductor layer having a carrier concentration less than 10.sup.16 cm.sup.-3, a third semiconductor layer having a carrier concentration more than 10.sup.17 cm.sup.-3 and a thickness less than 300 .ANG., a fourth semiconductor layer having a carrier concentration less than 10.sup.16 cm.sup.-3, and a fifth semiconductor layer having a carrier concentration more than 10.sup.17 cm.sup.-3 and, in which the first and fifth semiconductor layers are the same in conductivity type and the third semiconductor layer is different in conductivity type from the fifth semiconductor layer. In accordance with the present invention, the energy gap of the third semiconductor layer is larger than the energy gaps of the second and fourth semiconductor layers. An annular region of a semi-insulating material or of the same conductivity type as that of the third semiconductor layer may be formed around an active region to extend from the fifth semiconductor layer to the second semiconductor layer.
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Akiba Shigeyuki
Matsushima Yuichi
Sakai Kazuo
Utaka Katsuyuki
Adams Bruce L.
Burns Robert E.
Kokusai Denshin Denwa Kabushiki Kaisha
Lobato Emmanuel J.
Mintel William A.
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