Exposure device and method for producing a mask for use in the d

Photocopying – Projection printing and copying cameras – Step and repeat

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

355 67, 355 77, G03B 2742, G03B 2754, G03B 2732

Patent

active

06124922&

ABSTRACT:
An exposure device in which relative alignment between first and second objects is conducted by using an alignment and in which a pattern on the first object is exposed onto the second object to form the pattern on the first object onto the second object. The exposure device includes a mark detecting device for detecting an actual position of the alignment and for producing a detection signal, a moving device for moving the first and second objects relative to each other to perform alignment of the first and second objects and a control device for storing a positional error of the alignment mark generated when the alignment mark is formed on the second object and for controlling the alignment of the first and second objects by the moving device in accordance with the positional error and the detection signal obtained by the mark detecting device. Also disclosed is a mask producing method, an exposure method and semiconductor device producing methods that include related features.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 5262822 (1993-11-01), Kosugi et al.
patent: 5268744 (1993-12-01), Mori et al.
patent: 5333050 (1994-07-01), Nose et al.
patent: 5369486 (1994-11-01), Matsumoto et al.
patent: 5377009 (1994-12-01), Kitaoka et al.
patent: 5379108 (1995-01-01), Nose et al.
patent: 5465148 (1995-11-01), Matsumoto et al.
patent: 5550635 (1996-08-01), Saitoh et al.
patent: 5585923 (1996-12-01), Nose et al.
patent: 5654553 (1997-08-01), Kawakubo et al.
patent: 5674650 (1997-10-01), Dirksen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure device and method for producing a mask for use in the d does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure device and method for producing a mask for use in the d, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure device and method for producing a mask for use in the d will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2104582

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.