Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent
1997-12-29
2000-09-26
Abraham, Fetsum
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
257 72, 257 64, 257 65, 257 66, 257 70, 257 75, 257347, 257351, 438150, 438308, 438486, 438487, H01L 2900
Patent
active
061246026
ABSTRACT:
In a semiconductor circuit using a silicon film in which crystals grow in the direction parallel to a substrate, the distance between the position of a starting region of crystal growth and the position of the respective active layers are made the same. Thus, the difference of the characteristics due to the difference of the distance of crystal growth is corrected.
REFERENCES:
patent: 5315132 (1994-05-01), Yamazaki
patent: 5808321 (1998-09-01), Mitanaga et al.
patent: 5814835 (1998-09-01), Makita et al.
Koyama Jun
Ogata Yasushi
Ohtani Hisashi
Yamazaki Shunpei
Abraham Fetsum
Semiconductor Energy Laboratory Co,. Ltd.
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