Photosensitive organic polymeric material containing UV absorber

Details Photosensitive organic polymeric material containing UV absorber Photosensitive organic polymeric material containing UV absorber

1992-08-19

1994-04-12

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430931, 524 99, 524100, 524101, 524102, 524103, 524110, G03C 1815

Patent

active

053024974

ABSTRACT:
Compounds of the formula ##STR1## wherein R.sub.o, is hydrogen or alkylene-COOR where R is alkyl or hydroxyalkyl, R.sub.1 is hydrogen, alkyl, hydroxyalkyl, alkenyl or acyl, R.sub.2 and R.sub.3 are independently hydrogen, alkyl, alkenyl or alkoxy, R.sub.6 is hydrogen or alkyl, and X is --CH.sub.2 --, --NH--, --S-- or --O--, are suitable as UV absorbers for use in photosensitive organic materials in combination with a sterically hindered amine or hydroxyphenylbenzotriazole derivative.

REFERENCES:
patent: 3624087 (1971-11-01), Beck
patent: 3728350 (1973-04-01), Beck
patent: 3732204 (1973-05-01), Beck
patent: 3766187 (1973-10-01), Beck
G. S. Puranik et al., Monatshefte Chem., 94, 410 (1963).
Chem. Absts. 110, 31366t (1989).
G. S. Puranik et al., Helv. Chem. Acta, 62, 678 (1979).
R. R. Smolders et al., Bull. Soc. Chim. Belg. 93,239 (1984).
J. Hlubucek, et al., Aust. J. Chem. 23,1881 (1970).
A. C. Jain et al., Tetrahedron, 25, 275 (1968).

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