Photoresist composition with aromatic novolak binder having a we

Details Photoresist composition with aromatic novolak binder having a we Photoresist composition with aromatic novolak binder having a we

1993-03-01

1993-11-30

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430167, 430191, 430192, 430193, 430197, 430325, 430326, G03F 7023, G03F 732, G03F 7012

Patent

active

052664406

ABSTRACT:
A photoresist comprising a light sensitive component and an essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1,500 and a glass transition temperature in excess of 125.degree. C. If desired, the aromatic novolak resin may be blended with a conventional novolak resin to regulate the glass transition temperature of the resin.

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H. Hiraoka, "Functionally Substituted Novolak Resins: Lithographic Applications, Radiation Chemistry, and Photooxidation", Materials for Microlithography, American Chemical Society pp. 339-360 (1984).
H. Hiraoka et al., "Functionally Substituted Novolac Resins: Lithographic Applications Radiation Chemistry, and Photooxidation", Polym. Prepr. (Am. Chem. Soc., Dir. Polym. Chem.), vol. 25, No. 1, pp. 322-323 (1984).

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