Exposure apparatus

Details Exposure apparatus Exposure apparatus

1986-08-18

1987-12-08

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 41, G03B 2742

Patent

active

047115670

ABSTRACT:
An exposure apparatus for optically transferring a pattern of a circuit such as an integrated circuit on a semiconductor wafer. The positioning control of stepping movement of a movable stage holding the wafer thereon is effected in such a manner that even if a rotational displacement is present in the optical image of a mask pattern with respect to the moving coordinate axes of the stage the rotational displacement is substantially cancelled in a printed pattern.

REFERENCES:
patent: 3569718 (1971-03-01), Borner
patent: 4465368 (1984-08-01), Matsuura et al.
patent: 4506977 (1985-03-01), Sato et al.

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