Substrate supporting apparatus for a CVD apparatus

Details Substrate supporting apparatus for a CVD apparatus Substrate supporting apparatus for a CVD apparatus

1991-05-21

1993-03-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118715, 118500, C23C 1646

Patent

active

051923718

ABSTRACT:
A substrate supporting apparatus having a plurality of support plates positioned in parallel for supporting a plurality of substrates to be treated. The plates (13), (23) and (33) have respectively central openings (14), (24) and (34) which differ in size, and have respectively a plurality of clips (15), (25) and (35) along the periphery of the opening to support a substrate above the opening. The sizes of said openings (14, 24, 34) are determined depending upon reactive gas condition (e.g., temperature, pressure, flow characteristics of reactive gas) so that a uniform thin film can be formed on each substrate and an impurity introduced into the thin film can have a suitable concentration.

Affiliated with

Also associated with

Rating

Substrate supporting apparatus for a CVD apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate supporting apparatus for a CVD apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate supporting apparatus for a CVD apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-208169