Silica glass member for UV-lithography, method for silica glass

Details Silica glass member for UV-lithography, method for silica glass Silica glass member for UV-lithography, method for silica glass

1995-07-31

1997-12-30

Dzierzynski, Paul M.

Optical: systems and elements

Having significant infrared or ultraviolet property

359361, 65399, 252588, 501 53, 501905, G02B 600, C03C 304, C03C 408, C03C 1300

Patent

active

057037124

ABSTRACT:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of the using a secondary treatment for hydrogen introduction.

REFERENCES:
patent: 5086352 (1992-02-01), Yamagata et al.
patent: 5325230 (1994-06-01), Yamagata et al.
patent: 5410428 (1995-04-01), Yamagata et al.

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