Preparation of alkylesters of 0,0-dialkyl-4-phosphono-2-methyl-2

Organic compounds -- part of the class 532-570 series – Organic compounds – Phosphorus esters

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560219, C07F 940, C07C 6965

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057171289

ABSTRACT:
A process for the preparation of alkyl esters of 0,0-dialkyl-4-phosphono-2-methyl-2-butenoic acid containing a high percentage of E isomers, wherein the corresponding alkyl esters of 2-hydroxy-2-methyl-3-butenoic acid are caused to react with PBr.sub.3 or PCl.sub.3 at temperatures ranging from 0.degree. to 80.degree. C. in the absence of pyridine and, if desired, the resulting mixture comprising predominantly alkyl esters of 4-halo-2-methyl-2-butenoic acid is caused to react with trialkyl esters of phosphorous acid at temperatures ranging from 70.degree. to 140.degree. C. The end products are desirable C.sub.5 building blocks for polyene syntheses or preceding stages.

REFERENCES:
patent: 3163669 (1964-12-01), Stilz et al.
patent: 3806540 (1974-04-01), Martel et al.
patent: 4543417 (1985-09-01), Schmeider et al.
Helv. Chim. Acta 1970, pp. 383 and 394, vol. 53.
Tetrahedron 44 (1988), pp. 4713-4720.
Liebigs Ann. Chem. 1977, pp. 1146-1159.
Houben-Weyl, Methoden der Organischen Chemie, vol. 5/4, pp. 361, 367 f and 387f and 898-9 (1952).
Houben-Weyl, vol. 5/3, p. 898 ff (1952).
Helv. Chim. Acta 1966, pp. 369-390.

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