Projection-exposing apparatus with deflecting grating member

Details Projection-exposing apparatus with deflecting grating member Projection-exposing apparatus with deflecting grating member

1995-06-07

1997-12-30

Braun, Fred L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, G03B 2742, G03B 2754

Patent

active

057036756

ABSTRACT:
A projection-exposing apparatus has a mask which has a pattern formed with a pitch P.sub.R, an illuminating optical system for applying illuminating light from a light source to the mask, a projection optical system for projecting an image of the pattern onto a photosensitive substrate, and a deflecting grating member formed with a pitch P.sub.G disposed between the light source and the pattern of the mask for generating diffracted light. The pitch P.sub.G of the deflecting grating member is defined in the relation P.sub.G =2P.sub.R. The diffraction grating member is remote from the pattern on the mask by a distance .DELTA.t, where .DELTA.t .gtoreq.P.sub.G /2NA.sub.IL, NA.sub.IL being the numerical aperture of the illumination optical system.

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Jere D. Buckley et al, SPIE vol. 1088, Optical/Laser Microlithography II (1989), pp. 424-433.
The Japan Society of Applied Physics, (The 52nd Autumn Meeting, 1991) pp. 600-603.
Naomasa Shiraishi et al, SPIE Vo. 1674, Optical/Laser Microlithography V (1992), pp. 741-752.

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