Substrate processing method which utilizes a rotary member coupl

Details Substrate processing method which utilizes a rotary member coupl Substrate processing method which utilizes a rotary member coupl

1997-04-29

2000-06-13

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

4272555, 216 59, C23C 1646

Patent

active

060746963

ABSTRACT:
A substrate processing apparatus includes a processing vessel, a substrate holder, arranged in the processing vessel, for holding a target substrate, a rotary member coupled to the substrate holder and having a hollow portion, at an intermediate portion thereof in an axial direction, with a larger outer diameter than that of a portion thereof coupled to the substrate holder, a bearing portion for rotatably supporting the rotary member, a driving portion for supplying a rotational force to the rotary member, a heating portion for heating the target substrate through the substrate holder, and a cooling portion, arranged in the vicinity of the hollow portion of the rotary member through a small gap, for cooling the hollow portion.

REFERENCES:
patent: 5344492 (1994-09-01), Sato et al.

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