Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1983-12-01
1986-04-08
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430145, 430176, 430190, 430195, 430302, 430325, 534561, 534565, G03C 154, G03F 708
Patent
active
045813132
ABSTRACT:
A photosensitive composition containing a polymer, and a photosensitive material utilizing the composition are disclosed. The polymer, which may be in the form of a copolymer, includes a repeating unit of the formula (I): ##STR1## wherein Y is a divalent substituent; Z.sub.1 and Z.sub.2 independently each represents monovalent substituents; p and q are each 0 or an integer of 1 to 4; when p and q are each 2 or more, each of Z.sub.1 and Z.sub.2 may be the same or different; X.sup..crclbar. is an anion. The composition has high sensitivity and is capable of forming an image on a suitable photographic support without causing fog under incandescent lamps. The composition can be used to produce lithographic printing plates having high sensitivity as well as excellent ware resistance.
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Kosar, J., "Light-Sensitive Systems", J. Wiley and Sons, 1965, pp. 201-203 and 212-214.
Minamizono Junji
Sekiya Toshiyuki
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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