Projection exposure apparatus and projection exposure method

Details Projection exposure apparatus and projection exposure method Projection exposure apparatus and projection exposure method

1996-12-02

1998-04-21

Malley, Daniel P.

Photocopying

Projection printing and copying cameras

Step and repeat

355 50, 355 67, 355 71, 430 5, G03B 2752

Patent

active

057423768

ABSTRACT:
A projection exposure apparatus has an illumination optical system for directing exposure light to an illumination area with a predetermined shape on a mask with a pattern for transfer; a projection optical system for projecting an image of the pattern within the illumination area of the mask to a photosensitive substrate; a mask stage for scanning the mask in a predetermined scan direction with respect to the illumination area; and a substrate stage for scanning the photosensitive substrate in a direction corresponding to the scan direction in synchronism with the scanning of the mask. The relative positions of an image plane of the projection optical system and an exposure surface of the photosensitive substrate are changeable in the direction of the axis of the projection optical system and changed in a predetermined cycle when performing the scanning while projecting the image of the pattern of the mask to the photosensitive substrate.

REFERENCES:
patent: 4869999 (1989-09-01), Fukuda et al.
patent: 4992825 (1991-02-01), Fukuda et al.
patent: 5008205 (1991-04-01), Sindledecker
patent: 5117254 (1992-05-01), Kawashima et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5255050 (1993-10-01), Kitagawa
patent: 5285236 (1994-02-01), Jain
patent: 5291240 (1994-03-01), Jain
patent: 5331369 (1994-07-01), Terasawa et al.

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