Exposure apparatus with a pulsed laser

Details Exposure apparatus with a pulsed laser Exposure apparatus with a pulsed laser

1995-12-22

1999-10-19

McCamish, Marion

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 430 30, 372 20, 372 30, G03B 2754, H01S 313

Patent

active

059697997

ABSTRACT:
An exposure apparatus comprising (a) irradiating means for illuminating a mask with laser light from an excimer laser and (b) a projection optical system for projecting a pattern of the mask onto a substrate with the laser light, wherein a characteristic of the projection optical system is measured by use of a harmonic of a predetermined laser, and wherein the laser light from the excimer laser has a wavelength corresponding to that of the harmonic of the predetermined laser.

REFERENCES:
patent: 4811055 (1989-03-01), Hirose
patent: 4905041 (1990-02-01), Aketagawa
patent: 4968868 (1990-11-01), Aketagawa
patent: 5121160 (1992-06-01), Sano et al.
patent: 5250797 (1993-10-01), Sano et al.
patent: 5373515 (1994-12-01), Wakabayashi et al.
"Radiometry", vol. 1 of Optical Radiation Measuremnets, by Franc Grum and Richard Becherer, Academic Press, Orlando (1979), p. 147.

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