Production of triethylenediamine using surface acidity deactivat

Details Production of triethylenediamine using surface acidity deactivat Production of triethylenediamine using surface acidity deactivat

1996-11-15

1998-04-21

Berch, Mark L.

Organic compounds -- part of the class 532-570 series

Organic compounds

Nitrogen attached directly or indirectly to the purine ring...

544351, C07D48708

Patent

active

057419060

ABSTRACT:
A process for preparing triethylenediamine by passing an ethanolamine, ethyleneamine, piperazine or morpholine over a pentasil-type zeolite at elevated temperature characterized by employing a ZSM-5 zeolite in the hydrogen or ammonium form which has been pretreated with an aqueous solution of a chelating agent capable of forming a chelate-aluminum complex.

REFERENCES:
patent: 3442795 (1969-05-01), Kerr et al.
patent: 3443795 (1969-05-01), Gresens et al.
patent: 3956329 (1976-05-01), Murakami et al.
patent: 4388177 (1983-06-01), Bowes et al.
patent: 4701431 (1987-10-01), Pine
patent: 4804758 (1989-02-01), Hoelderich et al.
patent: 4814303 (1989-03-01), Chowdhry
patent: 4918233 (1990-04-01), Deehu
patent: 4966969 (1990-10-01), Sato et al.
patent: 5041548 (1991-08-01), Sato et al.
patent: 5242676 (1993-09-01), Apelian
patent: 5304695 (1994-04-01), Haag et al.
patent: 5567666 (1996-10-01), Beck et al.
Chen, N. Y., Degnan, Jr., Thomas F., and Smith, C. Morris "Molecular Transport and Reaction in Zeolites" VHC Publishers, Inc. 1994, pp. 15 and 17.
Translation of EP382 055 (1990).

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