Programmable ultraclean electromagnetic substrate rotation appar

Details Programmable ultraclean electromagnetic substrate rotation appar Programmable ultraclean electromagnetic substrate rotation appar

1996-07-10

1999-02-16

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

Work support

118500, 156345, C23C 1600

Patent

active

058715886

ABSTRACT:
An apparatus and method for wafer rotation in microelectronics manufacturing equipment is presented. The present invention combines an external stator assembly having a plurality of electromagnetic actuator coils with an internal rotor assembly having a plurality of multipolar permanent magnets or ferromagnetic coupling tabs. The rotor assembly supports the semiconductor wafer or any other substrate inside the process chamber. The electromagnetic actuator coils of the stator assembly receive a plurality of multi-phase, controlled frequency electrical currents to create magnetic fields around the actuator coils that interact with the multipolar permanent magnets or ferromagnetic coupling tabs of the rotor assembly to provide the rotational force to rotate the rotor assembly and thus, rotate the semiconductor wafer or any other substrate within the process chamber.

REFERENCES:
patent: 4210831 (1980-07-01), Hurst
patent: 4275371 (1981-06-01), Vogel
patent: 4789771 (1988-12-01), Robinson et al.
patent: 5113102 (1992-05-01), Gilmore
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5444217 (1995-08-01), Moore et al.
patent: 5468299 (1995-11-01), Tsai
McGraw-Hill Encyclopedia of Science and Technology, vol. 6, 1992, Jerome Meisel, "Electromagnet" pp. 154-155.
PCT Written Opinion; Mailing Date Jun. 4, 1997.

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