Optical thin film waveguide

Details Optical thin film waveguide Optical thin film waveguide

1985-01-30

1987-09-22

Lee, John

350 9634, G02B 612

Patent

active

046951229

ABSTRACT:
An optical waveguide obtained by forming on a substrate an amorphous silicon film which contains a predetermined quantity of at least one of the elements of hydrogen, nitrogen and oxygen so that the amorphous silicon film has a predetermined value of refractive index. The optical waveguide can be made easily by carrying out a sputtering operation, in which Si is used as a target with a mixed gas of argon and at least one of hydrogen, nitrogen and oxygen, or a mixed gas of hydrogen and at least one of nitrogen and oxygen used as a sputtering gas, the composition of the sputtering gas being controlled in a predetermined manner during the sputtering operation.

REFERENCES:
patent: 3962062 (1976-06-01), Ingrey
patent: 3999835 (1976-12-01), Newns et al.
patent: 4319803 (1982-03-01), Burmeister et al.
patent: 4464762 (1984-08-01), Furuya
Deitch et al, "Sputtered Thin Films for Integrated Optics", Applied Optics, vol. 13, No. 4, Apr. 1974, pp. 712-715.
Ingrey et al, "Variable Refractive Index and Birefringent Waveguides by Sputtering . . . ", Applied Optics, vol. 14, No. 9, Sep. 1975, pp. 2194-2198.

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