Method for cleaning a surface

Details Method for cleaning a surface Method for cleaning a surface

Filed on

1997-11-12

Date issued

1999-10-19

Examiner

Warden, Jill

Patent Class

Cleaning and liquid contact with solids

SubClass

Processes

SubSubClass

For metallic, siliceous, or calcareous basework, including...

Other Related Categories

134 1, 134 13, 134 3, 134 26, 134 6, 134 28, 134 29, B08B 300, B08B 700

Type

Patent

Status

active

Patent number

059682809

Description

ABSTRACT:
A surface such as that of a semiconductor wafer is cleaned by contacting the surface with a cleaning composition containing a polyelectrolyte.

REFERENCES:
patent: 2884728 (1959-05-01), Holman
patent: 2895814 (1959-07-01), Clark
patent: 3579455 (1971-05-01), Sabatelli et al.
patent: 3738868 (1973-06-01), Lancy
patent: 4129457 (1978-12-01), Basi
patent: 4569781 (1986-02-01), Fernholtz et al.
patent: 5277715 (1994-01-01), Cathey
patent: 5288332 (1994-02-01), Pustilinik et al.
patent: 5457261 (1995-10-01), Brown et al.
patent: 5520571 (1996-05-01), Brown et al.
patent: 5597443 (1997-01-01), Hempel
patent: 5662769 (1997-09-01), Schonauer et al.
patent: 5806126 (1998-09-01), De Larious et al.
Eitoku, Post-CMP Cleaning technology, Semicon Korea 95, pp. 29-36, Jan. 1995.
Nadahara et al, an SPIE abstract of "Process damage in single-wafer cleaning process" published in Proc. SPIE, vol. 3215, pp. 137-143, Sep. 1997.

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