Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1996-06-05
1997-12-30
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 37302
Patent
active
057033765
ABSTRACT:
A system for lithographic rastering of an image, defined by an array of pixels, onto an image-accepting substrate that allows irradiation of the total pixel pattern in reduced time. The total image is first divided into a collection of one or more geometrically isolated pixel arrays, with all pixels in an array being connected to each other. Each pixel array is decomposed into a fine region, consisting of all image pixels within P pixels of a boundary of that array, where P is a selected positive integer, such as 1, 2 or 3, and a bulk region consisting of all image pixels in that array that are not part of a fine region. A pixel array may include one or more bulk regions and one or more fine regions. A fine region for a pixel array is further decomposed into a first fine sub-region with pixel width at least equal to P1 pixels, where P1 is a selected integer satisfying 2.ltoreq.P1.ltoreq.P, and a second fine sub-region with pixel width no greater than P1-1 pixels.
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LSI Logic Corporation
Nguyen Kiet T.
Schipper John
Weiss Franklyn C.
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