Method of making a single chip temperature compensated reference

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29573, 29578, 148 15, 148175, 148179, 357 13, 357 20, 357 28, 357 33, 357 52, 357 76, 357 86, 357 89, H01L 2122, H01L 2990

Patent

active

041264967

ABSTRACT:
A reference diode and a method for making same are described, wherein a single wafer of semiconductive material is processed to provide a reverse PN junction acting in its breakdown region and to provide one or more forward PN junctions in electrical series with the reverse junction. A wafer of semiconductive material of one conductivity type is diffused with an impurity to form a plurality of regions of semiconductive material of opposite conductivity type. The regions are laterally displaced from each other and each forms a reverse PN junction at the interface between the region and the remainder of the wafer. An impurity is then diffused into one or more of these regions to form one or more forward PN junctions. An additional reverse PN junction is then formed between and adjacent to two of the previously formed regions. The latter reverse PN junction is formed by alloying or diffusing an impurity into the wafer to provide a region of opposite conductivity type having a higher conductivity than the adjacent regions. The reverse PN junction thus formed by the latter step exhibits a lower breakdown voltage than the adjacent reverse PN junctions. All exposed PN junctions extend to only one surface of the wafer and are passivated. Metal contact pads are then deposited on the opposing faces of the wafer to permit axial connections to the temperature compensated diode.

REFERENCES:
patent: 3341377 (1967-09-01), Wacker
patent: 3410735 (1968-11-01), Hackley
patent: 3461324 (1969-08-01), Barry
patent: 3519900 (1970-07-01), Lawrence
patent: 3567965 (1971-03-01), Weinerth et al.
patent: 3574009 (1971-04-01), Chizinsky et al.
patent: 3739238 (1973-06-01), Hara

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making a single chip temperature compensated reference does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a single chip temperature compensated reference, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a single chip temperature compensated reference will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2048069

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.