Method for fabricating phase shifting mask and a phase shifting

Details Method for fabricating phase shifting mask and a phase shifting Method for fabricating phase shifting mask and a phase shifting

1997-05-14

1998-12-22

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058517081

ABSTRACT:
The method for fabricating a phase-shifting mask includes the steps of providing a substrate having a light shielding layer and a phase-shifting light transmitting layer sequentially formed thereon, first patterning the light shielding layer and the phase-shifting light-transmitting layer to form phase-shifting regions, and oxidizing sidewall portions of the light shielding layer in each phase-shifting region to form phase-shifting light-transmitting sidewall portions. The method further includes the steps of depositing photoresist over the substrate, second patterning the photoresist using the light shielding layer as a mask such that in each phase-shifting region a portion of the phase-shifting light-transmitting layer on the light shielding layer is exposed by removal of the photoresist, and forming a rim phase-shifting layer in each phase-shifting region using the photoresist pattern as a mask. The rim phase-shifting layer includes unexposed portions of the phase-shifting light-transmitting layer and the phase-shifting light transmitting sidewall portions. Then, a half-tone layer in each phase-shifting region is formed using the photoresist pattern as a mask such that a rim phase-shifting layer surrounds each half-tone layer.

REFERENCES:
patent: 5244759 (1993-09-01), Pierrat
patent: 5536606 (1996-07-01), Doan
chou et al.; "Simulation and Fabrication of a New Phase Shifting Mask for 0.35 um contact hole pattern transfer : Halftone-Rim"; SPIE vol. 2087; pp. 380, May 1993.
"0.3-micron optical lithography using a phase-shifting mask," Terasawa et al., SPIE, vol. 1088, Optical/Laser Microlithography (1989), pp. 25-33.
"Improving Resolution in Photolithography with a Phase-Shifting Mask," Levenson et al., IEEE, vol. Ed-29, No. 12, Dec. 1982, pp. 1828-1836.
"New Phase Shifting Mask with Self-aligned Phase Shifters for a Quarter Micron Photolithography," Nitayama et al., IEDM, 1989, pp. 57-60, 3.3.1-3.3.4.

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