Over-flow tank for a semiconductor wafer washing apparatus

Details Over-flow tank for a semiconductor wafer washing apparatus Over-flow tank for a semiconductor wafer washing apparatus

1990-05-02

1992-11-03

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With non-impelling fluid deflector or baffle other than...

134902, 137574, 137592, 454 63, B08B 304

Patent

active

051599465

ABSTRACT:
An over-flow tank for a semiconductor wafer washing apparatus includes a pair of opposed extensions integrally formed on a pair of opposed side walls of the tank. One of the extensions is provided with pipes and/or other devices. This form of attachment prevents formation of a stepped portion on which dust may accumulate. The extensions also act to guide the flow of clean air over the tanks, so that vapor formed in a chemical liquid tank in one row of such tanks is prevented from entering a pure water tank in an adjacent row.

REFERENCES:
patent: 592721 (1897-10-01), Barnhart et al.
patent: 1976879 (1934-10-01), Ewer
patent: 3133490 (1964-05-01), Buck
patent: 4135530 (1979-01-01), Cheney
patent: 4325394 (1982-04-01), Reams
patent: 4361163 (1982-11-01), Aigo
patent: 4520834 (1985-06-01), DiCicco
patent: 4753258 (1988-06-01), Aigo
patent: 4804990 (1989-02-01), Jessop

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