Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-10-24
1982-07-13
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 430326, 524108, G03C 154, G03C 500, G03C 172
Patent
active
043395228
ABSTRACT:
Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
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Kammula, S. et al., J. Org. Chem., vol. 42, No. 17, pp. 2931-2932, 1977.
Dinaburg, M. S., "Photosensitive Diazo Compounds", Focal Press, pp. 31-32 and 181-182, 1964.
Balanson Richard D.
Clecak Nicholas J.
Grant Barbara D.
Ouano Augustus C.
Bowers Jr. Charles L.
International Business Machines - Corporation
Walsh Joseph G.
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