Silica-containing vibration damper and method

Adhesive bonding and miscellaneous chemical manufacture – Methods – Surface bonding and/or assembly therefor

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4284111, B32B 3104

Patent

active

058513272

ABSTRACT:
A method for vibrationally damping an article that is subject to resonant vibrations comprises the steps of providing a vibration damper and applying the vibration damper to the article to damp the resonant vibrations. The vibration damper comprises an acrylate viscoelastic vibration damping material and an effective amount of hydrophobic silica. The invention also relates to vibration dampers that utilize the acrylate viscoelastic vibration damping material as well as articles that incorporate the vibration dampers.

REFERENCES:
patent: 3489242 (1970-01-01), Gladding et al.
patent: 3833404 (1974-09-01), Sperling et al.
patent: 4678828 (1987-07-01), Nakamura
patent: 4710536 (1987-12-01), Klingen et al.
patent: 4749590 (1988-06-01), Klingen et al.
patent: 4789586 (1988-12-01), Morimura
patent: 5024880 (1991-06-01), Veasley et al.
patent: 5161338 (1992-11-01), Tada
patent: 5256223 (1993-10-01), Alberts et al.
patent: 5262232 (1993-11-01), Wilfong
patent: 5279896 (1994-01-01), Tokunaga
patent: 5335463 (1994-08-01), Reinhall
Hydrophobic AEROSIL.RTM. Manufacture, Properties and Applications, Technical Bulletin Pigments, No. 6, Degussa Corporation , Aug. 1986.

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