Method of coating substrates with an abrasive layer

Details Method of coating substrates with an abrasive layer Method of coating substrates with an abrasive layer

1981-04-20

1982-07-13

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 39, 4272553, 427295, 427296, 427337, B05D 306

Patent

active

043394710

ABSTRACT:
A method for preparing an abrasive SiO.sub.x coating, wherein 1.ltoreq..times..ltoreq.2, on a substrate by glow discharge deposition wherein the deposition on the substrate in a vacuum chamber is interrupted before the desired final SiO.sub.x coating thickness is obtained. SiH.sub.4 and N.sub.2 O are subjected to a glow discharge and SiO.sub.x is deposited onto the substrate. The deposition is interrupted, SiH.sub.4 is removed from the vacuum chamber and the SiO.sub.x coating is exposed to oxygen. These steps are repeated until the desired final SiO.sub.x coating thickness is obtained.

REFERENCES:
patent: 4104832 (1978-08-01), Keizer
patent: 4243395 (1981-01-01), Dholakia
patent: 4260647 (1981-04-01), Wang et al.
Joyce et al., "Silicon Oxide and Nitride Films Deposited by an R. F. Glow-Discharge", Thin Solid Films, vol. 1, pp. 481-494, (1967-1968).

Affiliated with

Also associated with

Rating

Method of coating substrates with an abrasive layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of coating substrates with an abrasive layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of coating substrates with an abrasive layer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-203953