Illumination apparatus

Illumination – Light source and modifier – Plural serial lens elements or components

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362 32, 350 9624, 350 9625, 355 78, F21V 704, G03B 2702

Patent

active

046835245

ABSTRACT:
An illumination apparatus for illuminating a surface, having formed thereon a pattern, to transfer the pattern onto a semiconductor wafer. The apparatus includes an elliptic mirror for forming an image of a light source, an imaging system for re-imaging the image of the light source, formed by the elliptical mirror, while causing a curvature of field, a multi-beam generating system disposed relative to the imaging system so that the optimum focus located at the off-axis position of the imaging system is coincident with an input surface of the multi-beam generating system, and a collimator for directing to the pattern surface a number of discrete light beams generated by the multi-beam generating system to illuminate the pattern surface. Whereby a uniform intensity distribution of the light illuminating the pattern surface and a high light-collecting efficiency are assured.

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patent: 4375315 (1983-03-01), Lacombat et al.
patent: 4441817 (1984-04-01), Pryer
patent: 4497013 (1985-01-01), Ohta
patent: 4523806 (1985-06-01), Kojima et al.

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