Susceptor and baffle therefor

Details Susceptor and baffle therefor Susceptor and baffle therefor

1995-04-18

1996-05-21

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118715, 118725, 118730, C23C 1600

Patent

active

055185495

ABSTRACT:
A susceptor for holding semiconductor wafers in a barrel reactor for chemical vapor deposition of material on the wafers having a baffle for reducing the amount of material deposited at the bottom of the lowest wafers held in the susceptor. The baffle includes a plate mounted on the bottom of the susceptor and a deflector for each wall of the susceptor. The deflectors each have the shape of a chordal section of a cylinder and are mounted on the plate against a respective wall of the susceptor below the lowest wafer-holding recess on that wall of the susceptor.

REFERENCES:
patent: 3623712 (1971-11-01), McNeilly et al.
patent: 4047496 (1977-09-01), McNeilly et al.
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4728389 (1988-03-01), Logar
M. L. Hammond, "Introduction to Chemical Vapor Deposition", Solid State Technology/Dec. 1979, pp. 60-65.

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