Layer construction with an organic layer and a transparent cover

Details Layer construction with an organic layer and a transparent cover Layer construction with an organic layer and a transparent cover

1997-04-22

1998-07-28

Turner, Archene

Etching a substrate: processes

Gas phase etching of substrate

216 95, 427307, 427322, 427536, 427577, 427596, 4272481, 427249, 4272553, 4272556, 4272557, 4274071, 427410, 4274191, 4274195, 4274197, 427444, B05D 300

Patent

active

057858764

ABSTRACT:
A layer construction with an organic layer and a transparent cover layer which covers the organic layer and which is harder than the organic layer, and a process for producing such a layer construction in which the cover layer is deposited on the surface of the organic layer from a precursor material present in the gas phase. In order to improve the optical quality of the layer construction, the cover layer, at least in a transition region between the organic layer and the cover layer, is deposited with an index of refraction which differs by a maximum of 20%, in particular by a maximum of 10%, from the index of refraction of the underlying organic layer.

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patent: 5485804 (1996-01-01), Adair et al.
patent: 5628920 (1997-05-01), Fuesser et al.

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