Photographic light sensitive material with antistatic property

Details Photographic light sensitive material with antistatic property Photographic light sensitive material with antistatic property

1979-06-04

1980-10-21

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430527, 430533, 430537, 430631, 430635, G03C 178, G03C 196

Patent

active

042295246

ABSTRACT:
A photographic light sensitive material which contains, in at least one layer, a copolymer having a repeating unit represented by the following general formula (I): ##STR1## wherein R.sub.f represents a perfluoroalkyl group having 2 to 12 carbon atoms which may contain one hydrogen atom at the .omega.-position or a perfluoroalkenyl group; R represents a hydrogen atom or a methyl group; p represents an integer of 1 to 5; m represents an integer of 5 to 50; n represents zero or an integer of 1 to 20; and Y represents a hydrogen atom, an alkyl group having 1 to 24 carbon atoms, an alkenyl group, a phenyl group, an alkylphenyl group or one of the groups represented by R.sub.f ; whereby antistatic property (even under low humidity) and adhesion resisting property are improved without adversely affecting photographic characteristics.

REFERENCES:
patent: 3753716 (1973-08-01), Ishihara et al.
patent: 3850640 (1974-11-01), Babbitt et al.
patent: 3850642 (1974-11-01), Bailey, Jr. et al.
patent: 3884699 (1975-05-01), Cavallo et al.
patent: 3888678 (1978-06-01), Bailey, Jr. et al.

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