Exposure apparatus with variable alignment optical system

Details Exposure apparatus with variable alignment optical system Exposure apparatus with variable alignment optical system

1994-12-16

1996-11-05

Pendegrass, Joan H.

Photocopying

Projection printing and copying cameras

Step and repeat

250548, 356401, H01L 21027

Patent

active

055722881

ABSTRACT:
An exposure apparatus according to the present invention comprises a projection optical system for transferring a pattern of an image on a mask onto a photosensitive substrate, a plurality of alignment optical systems for independently detecting a plurality of alignment marks provided at least on said mask and detecting associated alignment marks through respective objective lenses provided corresponding thereto, and a variable optical system for obtaining a reduced image of the mask, set between a first plane on which the mask is to be located and a second plane which is parallel to the first plane and on which the objective lenses are to be located. Particularly, the variable optical system is so designed as to avoid overlap of beams entering the respective objective lenses provided for the alignment optical systems upon observation of the associated alignment marks through the respective alignment optical systems.

REFERENCES:
patent: 4801208 (1989-01-01), Katoh et al.
patent: 4851978 (1989-07-01), Ichihara
patent: 4939630 (1990-07-01), Kikuchi et al.
patent: 4962318 (1990-10-01), Nishi
patent: 5118953 (1992-06-01), Ota et al.
patent: 5138176 (1992-08-01), Nishi
patent: 5214489 (1993-05-01), Mizutani
patent: 5237367 (1993-08-01), Kudo
patent: 5245384 (1993-09-01), Mori
patent: 5272501 (1993-12-01), Nishi et al.

Affiliated with

Also associated with

Rating

Exposure apparatus with variable alignment optical system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus with variable alignment optical system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus with variable alignment optical system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2018391