Wafer holder for semiconductor wafer polishing machine

Details Wafer holder for semiconductor wafer polishing machine Wafer holder for semiconductor wafer polishing machine

1994-10-11

1996-11-05

Rose, Robert A.

Abrading

Work holder

Clamp

451398, B24B 722

Patent

active

055710441

ABSTRACT:
A semi-conductor wafer polishing machine having at least one polishing pad assembly and at least one wafer holder positioned to hold a semi-conductor wafer against the polishing pad assembly includes a joint having two axes of rotation intersecting at a center of rotation. A wafer chuck is supported on the joint adjacent the periphery of the chuck to provide higher material removal rates at the center of the wafer than the periphery of the wafer during polishing.

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"A New Pad and Equipment Development for ILD Planarization" by Toshiyasu Beppu, Motoyuki Obara and Yausuo Minamikawa, Semiconductor World, Jan., 1994, MY Mar. 17, 1994.
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Practical Ideas, Jun. 1994, p. 67.

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