Process of making tosylbenzyl formamide derivatives

Details Process of making tosylbenzyl formamide derivatives Process of making tosylbenzyl formamide derivatives

1997-03-17

2000-08-15

Ramsuer, Robert W.

Organic compounds -- part of the class 532-570 series

Organic compounds

Amino nitrogen containing

C07C23114

Patent

active

061039365

ABSTRACT:
The present invention is to a novel process for the preparation of a compound of the formula: ##STR1## wherein p is 0, or 2;

REFERENCES:
Olijnsma et al., CA 77:101022, 1972.
Gallagher et al., "2,4,5-Triarylimidazole Inhibitors of Il-1 Biosynthesis", Bioorganic & Medicinal Chemistry Letters, 5 (11), pp. 1171-1176 (1995).
R.P. Soni, Aust.J.Chem., 35, p. 1493-6 (1982).
VanLeusen et al., J.O.C., 42, p. 1153 (1977).
Kumada et al., Tetrahedron Letters, 22, p. 5319 (1981).
Pridgen, J.Org.Chem., 47, p. 4319 (1982).
Stille, J.Amer.Chem.Soc., 109, p. 5478 (1978).
Fischer et al., Rec.Trav.Chim.Pays.Bas., 84, p. 439 (1965).
Snieckus, V., Tetrahedron Letters, 29, 2135 (1988).
Terashimia, M., Chem.Pharm.Bull., 11, p. 4755 (1985).
Thompson, W.J., et al., J.Org.Chem., 49, p. 5237 (1984).
Garigipati, R., Tetrahedron Letters, 31,p. 190 (1989).
Engel & Steglich, Liebigs Ann. Chem., 1916 (1978).
Strzybny et al., J. Org. Chem., 28, p. 3381 (1963).
Zavyalov, et al., Khim Farm Zh, 26(3), p. 88 (1992) (With Translation).
Gilbert, Synthesis, pp. 30-32 (1972).
Morton et al., Tetrahedron Letters, 4123 (1982).
Armarego, W. J. Chem. Soc., (JCSOA9) p. 561 (1962).
Budesinsky et al., Collection Czechoslov. Chem. Commun., vol. 37, pp. 1721-1733 (1972).

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