Pressure relieving pellicle

Details Pressure relieving pellicle Pressure relieving pellicle

1993-04-13

2000-08-15

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428 14, G03F 900

Patent

active

061034274

ABSTRACT:
A pattern mask pellicle comprising a peripheral frame, a transparent film extending across the top peripheral surface of the frame, and a peripheral gasket adhered to the bottom peripheral surface of the frame, the frame/gasket assembly including at least one tacky, continuous, tortuous path connecting an opening in the interior wall of the assembly with an opening in the exterior wall of the assembly. At least one pellicle is mounted on a pattern mask substrate to protect the pattern area during imaging in the production of integrated circuits.

REFERENCES:
patent: 4996106 (1991-02-01), Nakegawa et al.

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