Photomask encapsulation

Details Photomask encapsulation Photomask encapsulation

1983-04-25

1985-08-27

Lesmes, George F.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

428701, 428450, 428210, 430 5, G03F 100, H01L 2130

Patent

active

045378134

ABSTRACT:
A photomask (50) used for form patterns on a resist coated semiconductor wafer is comprised of a light transmissive baseplate (52) having a metallic pattern (54) thereon. A plasma deposited SiO.sub.2 conformal, electrically resistive, coating (56) covers the patterned baseplate (52), wherein the coating material is substantially the same refractive index as the baseplate.

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patent: 4361643 (1982-11-01), Banks et al.
patent: 4405701 (1983-09-01), Banks et al.
IBM Tech. Disc, vol. 14, No. 1, Jun. 1971, J. Sybalski.

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