Polymerization compositions and processes having polymeric bindi

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

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96 351, 96115P, 20415915, 260875, 260879, 260881, 260884, 260885, 260886, 427 43, 427 44, 427 54, 428458, 428461, 428462, 428463, C08F 800, G03C 168

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039533093

ABSTRACT:
A process for making photoresists which comprises preparing a photopolymerizable layer of an addition polymer, an initiator system, and a polymerizable inhibitor, using a preformed macromolecular binding agent which is a copolymer of a first monomeric material containing one or more non-acidic vinyl-type compounds and a second monomeric material containing one or more alpha,beta-unsaturated carboxyl-containing monomers, wherein the ratio of the first monomer to the unsaturated carboxylic-containing monomer is sufficient to render the binding agent soluble in a dilute alkaline solution; thereafter exposing a portion of the photopolymerizable layer to actinic light; and washing said layer with a dilute aqueous alkaline solution to dissolve the unexposed portion of the photopolymerizable layer. Preferably, the photopolymerizable layer is supported on a metallic substrate prior to said washing step.

REFERENCES:
patent: 2893868 (1959-07-01), Barney
patent: 3718473 (1971-01-01), Gervay et al.
patent: 3833384 (1974-09-01), Noonan et al.
patent: 3879204 (1975-04-01), Gervay

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