Apparatus and method for drying a semiconductor member

Details Apparatus and method for drying a semiconductor member Apparatus and method for drying a semiconductor member

1998-08-12

2000-08-15

Wilson, Pamela A.

Drying and gas or vapor contact with solids

Process

With contacting of material treated with solid or liquid agent

34469, 34470, 34471, 34 75, 34 78, 134108, 134902, F26B 300

Patent

active

06101737&

ABSTRACT:
A drying apparatus and method of drying is provided for drying a semiconductor member mounted in a carrier that is placed in a processing tank through contact with isopropyl alcohol. An isopropyl alcohol liquid is vaporized in a bottom portion of the processing tank, and the resulting vapor is condensed in its top portion. A heater is disposed so as to heat the inside of the processing tank to keep the inside at a predetermined temperature range in a middle-layer portion, i.e., a drying portion, of the processing tank. The heater is covered with a heat insulating member.

REFERENCES:
patent: 5371950 (1994-12-01), Schumacher
patent: 5539995 (1996-07-01), Bran
patent: 5954911 (1999-09-01), Bergman et al.

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