Method and apparatus for controlling the flow rate of mercury in

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

20415721, 20415722, 422186, 4221863, B01D 500

Patent

active

049815652

ABSTRACT:
A method for increasing the mercury flow rate to a photochemical mercury enrichment utilizing an entrainment system comprises the steps of passing a carrier gas over a pool of mercury maintained at a first temperature T1, wherein the carrier gas entrains mercury vapor; passing said mercury vapor entrained carrier gas to a second temperature zone T2 having temperature less than T1 to condense said entrained mercury vapor, thereby producing a saturated Hg condition in the carrier gas; and passing said saturated Hg carrier gas to said photochemical enrichment reactor.

REFERENCES:
patent: 3379252 (1983-04-01), Work
patent: 3897331 (1975-07-01), Smith et al.
patent: 3983019 (1976-07-01), Botter nee Bergheaud
patent: 4514363 (1985-04-01), Dubrin
patent: 4516527 (1985-05-01), Sugioka
patent: 4527086 (1985-07-01), Maya
patent: 4678550 (1987-07-01), Grossman
patent: 4713547 (1987-12-01), Grossman
patent: 4746832 (1988-05-01), Grossman et al.
Grossman et al., U.S. Ser. No. 815,150--Filed: 12/31/85.
Waymouth, Electric Discharge Lamps, MIT Press, (1971).
Webster and Zare, J. Phys. Chem., 85:1302, (1981).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for controlling the flow rate of mercury in does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for controlling the flow rate of mercury in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for controlling the flow rate of mercury in will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1994314

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.