Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
Patent
1995-12-15
1996-12-17
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Charge transfer device
257233, 257249, 257435, 257637, 257640, H01L 27148, H01L 29768
Patent
active
055856535
ABSTRACT:
A solid-state imaging device which restrains the smear phenomenon effectively without reduction of the dielectric breakdown strength between the transfer electrode and the light shielding film. A first insulating film covers photoelectrical converting regions each of which receives incident light through the first insulation film to generate and store a signal charge. A second insulating film covering a charge transfer region is of a layered structure containing a first insulation layer with a relatively lower dielectric constant such as SiO.sub.2 and a second insulation layer with a relatively higher dielectric constant such as Si.sub.3 N.sub.4. The distance between the transfer electrode and the light shielding film can be decreased, providing decrease in thickness of the first insulating film. The smear phenomenon is restrained effectively without reduction of the dielectric breakdown strength between the transfer electrode and the light shielding film.
REFERENCES:
patent: 4914493 (1990-04-01), Shiromizu
patent: 5181093 (1993-01-01), Kawaura
patent: 5306926 (1994-04-01), Yonemoto
patent: 5334867 (1994-08-01), Shin et al.
patent: 5424775 (1995-06-01), Kamisaka et al.
Yasuo Ihsihara et al., "A High Photosensitivity IL-CCD Image Sensor With Monolithic Resin Lens Array," IEDM, 1983, pp. 497-500.
Nobukazu Teranishi et al., "Smear Reduction in the Interline CCD Image Sensor," IEEE Transactions on Electron Devices, vol. ED-34, No. 5, May 1987, pp. 1052-1056.
NEC Corporation
Ngo Ngan V.
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