Thin film pattern and method of forming the same

Electrical generator or motor structure – Non-dynamoelectric – Piezoelectric elements and devices

Patent

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Other Related Categories

156643, 156644, 156647, 156656, 1566591, 156667, 310364, 310365, 428137, H01L 4108, H01L 21306, B44C 122, C03C 1500

Type

Patent

Status

active

Patent number

050380680

Description

ABSTRACT:
A thin film pattern and a method of fabricating the thin film pattern available for an ultrasonic transducer are disclosed. That is, an oriented thin film made of a material different from the material of a substrate is formed on the substrate, a mask having a predetermined pattern is formed on the thin film, and anisotropic etching is carried out for the thin film in accordance with the predetermined pattern of the mask, by using an etchant for selectively etching a predetermined crystallographic plane parallel to the surface of the thin film, to form the predetermined pattern in the thin film, thereby obtaining a thin film pattern.

REFERENCES:
patent: 3983515 (1976-09-01), Mitchell et al.
patent: 4106975 (1978-08-01), Berkenblit et al.
patent: 4354898 (1982-10-01), Coldren et al.
patent: 4675074 (1987-06-01), Wada et al.
patent: 4692653 (1987-09-01), Kushida et al.
Polla et al., "Monolithic Integrated Zinc-Oxide on Silicon Pyroelectric Anemometer", IEEE, 1983, IEDM 83, pp. 639-642.

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