Method for making free-standing diamond film

Plastic and nonmetallic article shaping or treating: processes – Gas or vapor deposition of article forming material onto...

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427553, 427577, 427249, 4272557, 264 39, 264219, B29C 4142, B29C 4148, C23C 1676, C23C 1650

Patent

active

053146522

ABSTRACT:
A method for making a free-standing synthetic diamond film of desired thickness, including the following steps: providing a substrate; selecting a target thickness of diamond to be produced, the target thickness being in the range 200 microns to 1000 microns; finishing a surface of the substrate to a roughness, R.sub.A, that is a function of the target thickness, the roughness being determined from ##EQU1## where t is the target thickness; depositing an interlayer on the substrate, the interlayer having a thickness in the range 1 to 20 microns; depositing synthetic diamond on the interlayer, by chemical vapor deposition, to about the target thickness; and cooling the synthetic diamond to effect the release thereof.

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patent: 4987002 (1991-01-01), Sakamoto et al.
patent: 5114745 (1992-05-01), Jones
patent: 5180571 (1993-01-01), Hosoya et al.
patent: 5183529 (1993-02-01), Potter et al.
patent: 5221501 (1993-06-01), Feldman et al.

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