Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From sulfur-containing reactant
Patent
1990-11-05
1992-09-29
Marquis, Melvyn I.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From sulfur-containing reactant
C08G 7514
Patent
active
051514958
ABSTRACT:
In a process for producing poly (p-phenylenesulfide) from an alkali metal sulfide and a p-dihalobenzene, a product polymer of an advantageously increased molecular weight is obtained by: providing a mixture comprising an alkali metal sulfide, a polar aprotic solvent, a sodium salt of an aliphatic carboxylic acid represented by the general formula: RCOONa (where R is an aliphatic hydrocarbon group having 1-20 carbon atoms), the content of water present in said mixture apart from any water of hydration or crystallization which may be contained in said sulfide and sodium salt being in the range of 5 to 20 moles per mole of said sulfide; thermally dehydrating said sulfide component in said mixture by removing at least part of the water from said mixture; and then contacting the resulting dehydrated mixture with a p-dihalobenzene.
REFERENCES:
patent: 4064114 (1977-12-01), Edmonds, Jr.
patent: 4324886 (1982-04-01), Edmonds, Jr. et al.
patent: 4368321 (1983-01-01), Sherk et al.
patent: 4371671 (1983-02-01), Anderson
patent: 4740569 (1988-04-01), Tieszen et al.
patent: 4794161 (1988-12-01), Kato et al.
patent: 5013822 (1991-05-01), Drake
patent: 5037953 (1991-08-01), Inoue et al.
Inoue Hiroshi
Kato Toshikazu
Ogawara Kensuke
Lee Helen F.
Marquis Melvyn I.
Toso Susteel Co., Ltd.
Tosoh Corporation
LandOfFree
Process for producing poly (para-phenylene-sulfide) does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing poly (para-phenylene-sulfide), we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing poly (para-phenylene-sulfide) will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1969308