Method of manufacturing optical low-pass filter

Details Method of manufacturing optical low-pass filter Method of manufacturing optical low-pass filter

1996-07-26

1998-05-26

Gross, Anita Pellman

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

348201, 359900, 359498, 359574, 349112, G02F 11333

Patent

active

057574499

ABSTRACT:
A mother layer made of a thermoplastic resin is formed on the substrate. The mother layer is etched to make a grating layer. The etching process is stopped so that an offset layer remains under the grating layer. The grating layer and the offset layer are baked to be molten. The baking process is stopped when a phase grating defined by a surface having a sinusoidal shape is formed.

REFERENCES:
patent: 3728014 (1973-04-01), Rosenblum
patent: 3821795 (1974-06-01), Okano
patent: 4472735 (1984-09-01), Shinozaki et al.
patent: 4998800 (1991-03-01), Nishida et al.
patent: 5046827 (1991-09-01), Frost et al.
patent: 5204765 (1993-04-01), Mitsui et al.
patent: 5457573 (1995-10-01), Iida et al.
patent: 5555129 (1996-09-01), Konno et al.
Fujisawa et al., "Optical Low-Pass Filter Using the Organic Optical Material", ITEJ Technical Report, vol. 14, No. 53, Sept. 1990, pp. 7-12.
O. Wada, "Ion-Beam Etching of InP and Its Application of High Radiance InGaAsP/Inp Light Emitting Diodes", J. electrochem, Soc. Solid-State Science and Technology, Vol. 131, No. Oct. 1984 pp. 2373-2380.

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