Polishing composition including an inhibitor of tungsten etching

Details Polishing composition including an inhibitor of tungsten etching Polishing composition including an inhibitor of tungsten etching

1998-05-29

2000-10-24

Breneman, R. Bruce

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

438693, 216 88, 216 89, 216 90, H01L 2100

Patent

active

061367117

ABSTRACT:
A chemical mechanical polishing composition comprising a composition capable of etching tungsten and at least one inhibitor of tungsten etching and methods for using the composition to polish tungsten containing substrates.

REFERENCES:
patent: 3385682 (1968-05-01), Lowen
patent: 3565707 (1971-02-01), Radimer et al.
patent: 3668131 (1972-06-01), Banush et al.
patent: 3843430 (1974-10-01), Kinder
patent: 4086176 (1978-04-01), Ericson et al.
patent: 4169337 (1979-10-01), Payne
patent: 4251384 (1981-02-01), Rooney
patent: 4345969 (1982-08-01), James et al.
patent: 4462188 (1984-07-01), Payne
patent: 4588421 (1986-05-01), Payne
patent: 4992135 (1991-02-01), Doan
patent: 5173438 (1992-12-01), Sandhu
patent: 5209816 (1993-05-01), Yu et al.
patent: 5230833 (1993-07-01), Romberger et al.
patent: 5340370 (1994-08-01), Cadien et al.
patent: 5391258 (1995-02-01), Brancaleoni et al.
patent: 5407527 (1995-04-01), Danielson et al.
patent: 5476606 (1995-12-01), Brancaleoni et al.
patent: 5571373 (1996-11-01), Krishna et al.
patent: 5575837 (1996-11-01), Kodama et al.
patent: 5614444 (1997-03-01), Farkas et al.
patent: 5622896 (1997-04-01), Knotter et al.
patent: 5645736 (1997-07-01), Allman
patent: 5735963 (1998-04-01), Obeng
patent: 5770095 (1998-06-01), Sasaki et al.
patent: 5783489 (1998-07-01), Kaufman et al.
patent: 5804513 (1998-09-01), Sakatani et al.
patent: 5827781 (1998-10-01), Skrovan et al.
patent: 5958288 (1999-09-01), Mueller et al.

Affiliated with

Also associated with

Rating

Polishing composition including an inhibitor of tungsten etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing composition including an inhibitor of tungsten etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing composition including an inhibitor of tungsten etching will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1963482