Sulfonium salts having bridged cyclic alkyl group useful as resi

Details Sulfonium salts having bridged cyclic alkyl group useful as resi Sulfonium salts having bridged cyclic alkyl group useful as resi

1997-07-10

1998-05-26

Young, Christopher G.

Organic compounds -- part of the class 532-570 series

Organic compounds

Sulfur containing

568 77, C07C33100, C07C38100

Patent

active

057568502

ABSTRACT:
The invention provides a photosensitive resin composition useful as a photoresist of chemical amplification type for deep UV lithography such as ArF excimer laser lithography. The resin composition contains, as an acid generator, an alkylsulfonium salt of the general formula (I), wherein R.sup.1 is a C.sub.7 to C.sub.12 alkyl having a bridged alicyclic structure or a C.sub.5 to C.sub.7 monocyclic alkyl, R.sup.2 is an alkyl, R.sup.3 is a C.sub.5 to C.sub.7 .beta.-oxomonocyclic alkyl or a C.sub.7 to C.sub.10 bridged cyclic alkyl having oxo group at the .beta.-position. The general formula (I) is inclusive of novel alkylsulfonium salts in which R.sup.1 is norbornyl group, adamantyl group or cyclohexyl group, R.sup.2 is methyl group and R.sup.3 is .beta.-oxocyclohexyl group or .beta.-oxonorbornane-2-yl group. ##STR1##

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