A1 alloy films and melting A1 alloy sputtering targets for depos

Details A1 alloy films and melting A1 alloy sputtering targets for depos A1 alloy films and melting A1 alloy sputtering targets for depos

1994-07-12

1996-03-19

Nakarani, D. S.

Stock material or miscellaneous articles

Composite

Of metal

420528, 420540, 420552, 420553, 428606, 428620, 428650, 428694RL, B32B 1504

Patent

active

055003010

ABSTRACT:
An Al alloy film containing one kind or two or more kinds of alloy components selected from a group of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and Mn in a total amount of 0.1 to 10 at %, and a melting Al alloy sputtering target for depositing the Al alloy film, wherein the above-mentioned film is used as a reflection film for an optical recording medium, a shading film for a liquid crystal display panel or for a solid image pickup device, and an Al alloy thin film line or electrode material for a semiconductor device.

REFERENCES:
patent: 4024567 (1977-05-01), Iwata et al.
patent: 5032470 (1991-07-01), Shindo et al.

Affiliated with

Also associated with

Rating

A1 alloy films and melting A1 alloy sputtering targets for depos does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with A1 alloy films and melting A1 alloy sputtering targets for depos, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and A1 alloy films and melting A1 alloy sputtering targets for depos will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1958553