Photomask material

Details Photomask material Photomask material

1988-08-08

1989-10-10

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, 428428, 428432, G03F 100

Patent

active

048731633

ABSTRACT:
A photomask material according to the present invention comprises a transparent substrate and a silicide film of a transition metal formed on the transparent substrate.

REFERENCES:
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patent: 4237150 (1980-12-01), Wiesmann
patent: 4284713 (1981-08-01), Sato et al.
patent: 4368230 (1983-01-01), Mizukami et al.
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patent: 4440841 (1984-04-01), Tabuchi
patent: 4472237 (1984-09-01), Deslauriers et al.
patent: 4661426 (1987-04-01), Matsuda
patent: 4717625 (1988-01-01), Watakabe et al.
patent: 4722878 (1988-02-01), Watakabe et al.
patent: 4783371 (1988-11-01), Watakabe et al.
patent: 4792461 (1988-12-01), Watakabe et al.
Watakabe et al., "High Performance Very Large Scale Integrated Photomask . . . ", J. Vac. Sci. Technol. B, vol. 41, No. 4, Jul./Aug. 1986, pp. 841-844.
Urdang et al., Random House College Dictionary, Random House Inc., N.Y., 1973.

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