Method of sythesizing carbon film and carbon particles in a vapo

Details Method of sythesizing carbon film and carbon particles in a vapo Method of sythesizing carbon film and carbon particles in a vapo

1985-08-14

1989-10-10

Bell, Janyce

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 37, 427 38, 427 39, 427249, 427255, B05D 306

Patent

active

048731153

ABSTRACT:
A vapor phase synthesis of carbon film and carbon particles using a single or a mixed gas capable of supplying halogen, hydrogen and carbon atoms is disclosed. Halogen radicals can suppress the desorption of carbon atoms from the substrate, and the carbon layer is obtained easily. Especially chlorine and fluorine atoms are effective. An electron beam diffraction pattern illustrated that diamond film can be obtained in this method.

REFERENCES:
patent: 3138435 (1964-06-01), Diefendorf
patent: 3335345 (1967-08-01), Diefendorf
patent: 3684585 (1972-08-01), Stroup et al.
patent: 3771976 (1973-11-01), Wakefield
patent: 4040870 (1977-08-01), Holzl
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4439463 (1984-03-01), Miller

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