Coating apparatus – Gas or vapor deposition – With treating means
Patent
1998-02-26
2000-10-24
Knode, Marian C.
Coating apparatus
Gas or vapor deposition
With treating means
118723I, 118723R, C23C 16509
Patent
active
061350524
ABSTRACT:
In a wafer temperature control method and a wafer temperature control device with which it is possible to raise the stability of the temperature of a wafer in a semiconductor manufacturing apparatus and the responsiveness of the temperature of the wafer to changes in a set wafer temperature and thereby obtain a higher quality product, the temperature of the wafer is controlled by both the flowrate of a coolant and the heat output of a heat source being controlled.
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Fujii Hitoshi
Hirano Shinsuke
Knode Marian C.
Sony Corporation
Zervigon Rudy
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