Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-11-22
1996-09-03
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430166, 430191, 4302751, G03F 709
Patent
active
055522556
ABSTRACT:
Proposed is an alkali-soluble, positive-working photo-sensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate such as tantalum to exhibit excellent adhesion of the patterned resist layer to the substrate surface. The composition comprises, in addition to a novolac resin as a film-forming agent and a naphthoquinone diazide group-containing compound as a photosensitizer, an aromatic compound having two benzene rings and at least five phenolic hydroxy groups in a molecule such as pentahydroxy and hexahydroxy benzophenone compounds as an adhesion improver.
REFERENCES:
patent: 4626492 (1986-12-01), Eilbeck
patent: 5077173 (1991-12-01), Schulz et al.
Kato Tetsuya
Kohara Hidekatsu
Nakayama Toshimasa
Takahashi Kouichi
Bowers Jr. Charles L.
Tokyo Ohka Kogyo Co. Ltd.
Young Christopher G.
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