Phase shift mask blank having a coated central shading pattern a

Details Phase shift mask blank having a coated central shading pattern a Phase shift mask blank having a coated central shading pattern a

1995-09-14

1999-02-09

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058692118

ABSTRACT:
In a method and an apparatus for processing, by the use of a processing solution, a substrate which has a principal surface divided into an unprocessing region and a processing region surrounding the unprocessing region, a guide member has an end portion which is faced with the processing region with a gap left between the processing region and the end portion and with an inside space left between the unprocessing region and the guide member. The processing solution is supplied to and kept in the gap due to capillarity and surface tension of the processing solution without being spread onto the unprocessing region. Thus, the processing region alone is processed by the processing solution. When the principal surface is supported by the guide member, the processing solution may be given from a back surface of the substrate to the gap through a side gap formed between the guide member and the substrate. Alternatively, when the guide member is covered over the principal surface of the substrate with the back surface of the substrate supported on a support member, the processing solution is fed onto the guide member and sent into the gap through via holes formed on the end surface of the guide member. The processing solution may be either a solvent or a resist solution. The substrate may serve to form a phase shift mask blank, a reticle testing substrate, or the like.

REFERENCES:
patent: 4510176 (1985-04-01), Cuthbert et al.
patent: 5234499 (1993-08-01), Sasaki
patent: 5238713 (1993-08-01), Sago
patent: 5258073 (1993-11-01), Meier
patent: 5474864 (1995-12-01), Isao

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